B.TechSemester 52021-22Vlsi TechnologyKEC-053
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Vlsi Technology (KEC-053) - AKTU Question Paper 2021-22

B.Tech · Semester 5 · Free PDF Download

This is the official AKTU Vlsi Technology Previous Year Question Paper for B.Tech Semester 5, academic session 2021-22. Published by Dr. A.P.J. Abdul Kalam Technical University (AKTU/UPTU), Lucknow. Free PDF download — no login required.

Course:B.Tech
Semester:Semester 5
Session:2021-22
University:AKTU / UPTU

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Questions Asked in 2021-22

Vlsi Technology (KEC-053) — extracted question text

Section AAttempt all q u e s t i o n s i n b r i e f . 2 x 10 = 20
  • a
    Discuss oxide charges
  • b
    What is electronic grade silicon
  • c
    Explain the purpose of oxidation
  • d
    How is wafer polishing done?
  • e
    What are positive and negative photoresist?
  • f
    What are the disadvantages of Electron Beam Lithography?
  • g
    What are the basic mechanisms of diffusion?
  • h
    State Fick’s second law of diffusion. i. Why is metallization done? j. What is the disadvantage of Sputtering?
Section BAttempt any three of the following: 10 x 3 = 30
  • a
    Explain Czocharlasky method of single crystal generation in detail
  • b
    Explain Plasma Oxidation technique for the growth of oxide layer
  • c
    Explain Chemical Vapor Deposition process
  • d
    Demonstrate various diffusion profiles of dopant atom with appropriate equations and curves and compare them
  • e
    What are the disadvantages of using Aluminum for metallization? How are they rectified?
Section CAttempt any one part of the following: 10 x 1 = 10
  • b
    Briefly explain Vacuum Deposition and Sputtering for metallization

Question text is extracted from the official AKTU question paper PDF above. Check the original PDF for equations, diagrams and complete wording. Extracted: 2026-08-23.

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