B.TechSemester 52021-22Vlsi TechnologyKEC-053
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Vlsi Technology (KEC-053) - AKTU Question Paper 2021-22

B.Tech · Semester 5 · Free PDF Download

This is the official AKTU Vlsi Technology Previous Year Question Paper for B.Tech Semester 5, academic session 2021-22. Published by Dr. A.P.J. Abdul Kalam Technical University (AKTU/UPTU), Lucknow. Free PDF download — no login required.

Course:B.Tech
Semester:Semester 5
Session:2021-22
University:AKTU / UPTU

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Questions Asked in 2021-22

Vlsi Technology (KEC-053) — complete question paper

Section AAttempt all q u e s t i o n s i n b r i e f . 2 x 10 = 20
  • a
    Discuss oxide charges
  • b
    What is electronic grade silicon
  • c
    Explain the purpose of oxidation
  • d
    How is wafer polishing done?
  • e
    What are positive and negative photoresist?
  • f
    What are the disadvantages of Electron Beam Lithography?
  • g
    What are the basic mechanisms of diffusion?
  • h
    State Fick’s second law of diffusion. i. Why is metallization done? j. What is the disadvantage of Sputtering?
Section BAttempt any three of the following: 10 x 3 = 30
  • a
    Explain Czocharlasky method of single crystal generation in detail
  • b
    Explain Plasma Oxidation technique for the growth of oxide layer
  • c
    Explain Chemical Vapor Deposition process
  • d
    Demonstrate various diffusion profiles of dopant atom with appropriate equations and curves and compare them
  • e
    What are the disadvantages of using Aluminum for metallization? How are they rectified?
Section CAttempt any one part of the following: 10 x 1 = 10
  • b
    Briefly explain Vacuum Deposition and Sputtering for metallization

Question text is extracted from the official AKTU question paper PDF above. Hindi translations are omitted — every question is printed in English in the original paper. Last verified: 2026-08-23.

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